WebApr 11, 2024 · An optimum geometry of ISFET was obtained satisfying the required leakage current and gate capacitance (COX). The role of isothermal point and temperature on ISFETs were also investigated. ... Kundu S (2013) Simulation to study the effect of oxide thickness and high-K dielectric on drain-induced barrier lowering in N-type MOSFET. … WebApr 1, 2003 · Gate-induced drain leakage (GIDL) current is investigated in single-gate (SG) ultra-thin body field effect transistor (FET), symmetrical double-gate (DG) FinFET, …
Influence of Field-Induced Drain on the Characteristics of Poly-Si …
WebSignificant gate-induced drain leakage current can be detected in thin gate oxide MOSFETs at drain voltages much lower than the junction breakdown voltage. This … WebGate Induced Drain Leakage (GIDL) • Appears in high E-field region under gate/drain overlap causing deep depletion • Occurs at low V g and high V d bias • Generates carriers into substrate from surface traps, band-to-band tunneling • Localized along channel width between gate and drain • Thinner oxide, higher V dd, lightly-doped drain ... marvel sfondo
Steady and Transient State Analysis of Gate Leakage Current …
http://www.ijste.org/articles/IJSTEV1I10050.pdf Webgate-induced drain leakage, and punch-through leakage currents. A large component of off-state leakage current is gate induced drain leakage (GIDL) current, caused by band-to band tunneling in the drain region underneath the gate when there is a large gate-to-drain bias, there can be sufficient energy-band bending near the interface between ... WebAs a result, the region near drain contact is burned by thermal runaway. Moreover, it is demonstrated that higher bus voltage and larger load inductance will increase the UIS-induced failure risk, while the gate resistance, turn-off gate voltage and ambient temperature exhibit little influences upon the UIS withstanding capability of the device. datasheet do ci 74138